Shared foundry processing of RF device
1) Common mask set for fabrication of discrete devices and pre-matched MMICs on4-inch substrat
2) Front-side active devices performed at IEMN while passives and back-end processing at the foundry for innovative technology assessment on industry representative devices
High power on-wafer power test bench at 40 GHz and 94 GHz
Active on-wafer Loadpull high power test bench at 40 GHz and 94 GHz
Both CW and pulsed mode (1μs pulsed width) available
Flexible impedance matching and high input power for optimum performance assessment
Partially funded by the EDA EU project EUGANIC and the French national network LABEX GANEXT