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PLATEFORME : CENTRALE DE MICRO NANO FABRICATION
Slide thumbnailPLATEFORME : CENTRALE DE MICRO NANO FABRICATION
PLATEFORME : CENTRALE DE MICRO NANO FABRICATION
PLATEFORME : CENTRALE DE MICRO NANO FABRICATION

CMNF - Micro Nano Fabrication Centre


François VAURETTE,

Head of the Micro Nano Manufacturing Centre CMNF
+33 (0)3 20 19 79 79
francois.vauretteuniv-lille.fr

Download the brochure (Version 4 Sept. 2024)

CMNF's publications

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Contact the CMNF

Le site internet: Deposits and epitaxy division
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The MicroNanofabrication platform covers 1600m² of ISO6 certified clean room and an additional 260m² dedicated to the back-end. The plant has a wide range of equipment from the basics of the semiconductor industry to state-of-the-art micro-nanofabrication equipment.

A list of equipment is available here.

Historically designed for the development of components mainly in the field of electronics, the IEMN's clean room has today acquired a reputation of a different scale: a state-of-the-art multidisciplinary platform for the fabrication of advanced components and systems in various fields such as bioMEMs, photonics or acoustics. With a team of about twenty qualified engineers and technicians working in close collaboration with researchers, PhD and post-doctoral students, the facility allows to explore the most ambitious projects offered by micro and nanotechnologies.

The main mission of the CMNF is to be the technological support for the Institute's research teams. In addition, projects from outside the IEMN can be supported via a project reception cell thanks to the RENATECH network(national network of large micro-nanofabrication power plants) of which the IEMN is an active member.

The CMNF thus aims to remain at the forefront of technology and to put its infrastructure and expertise at the service of the laboratory's projects but also of external companies and institutions.

In order to carry out all the technological projects, about 200 projects per year, the technology center is managed by a technical team of about twenty engineers and cleanroom technicians. The Micro Nano Manufacturing center is organized around major areas of expertise: Growth and deposition of thin films, Lithography, Etching, Process characterization, Integration-Assembly-Packaging, Thermal treatments-Ion implantation or BioMicrofluidics.

Most of the plant's equipment is accessible to all users with authorization. Only some very sensitive equipment is restricted, due to its complex handling or the associated risks.

There is also a project reception unit, a relay of the Renatech network internally, which allows the technical team to request the realization of technological bricks or a complete technological process (component, micro-object, characterization...).

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  • CMNF - Micro and Nano Fabrication Center
    • CMNF Staff
    • Deposits and epitaxy division
      • Chemical Vapour Deposition (CVD)
      • Physical Vapour Deposition (PVD)
      • Inkjet printing
      • Heat tratments
      • Chemical synthesis and surface functionalisation
      • Epitaxial growth
    • Lithography Unit
      • Electronic Lithography
      • Optic Lithography
      • 2D laser lithography
      • Collage
    • Engraving and implantation pole
      • Etching and plasma treatment
      • Deep etching of silicon
      • Chemical vapor etching
      • Ion beam etching
      • Focused Ion Beam
      • Ion implantation
      • Wet etching and surface preparation
    • In Line Analysis Unit
      • Structural characterizations
      • Electrical properties
      • Propriétés optiques et spectroscopies
      • Microscopy Topography Morphology
      • Faisceau / beam
    • Soft Lithography and Bio Microfluidics
      • Soft lithography
      • BioMicroFluidics
    • Packaging Division
      • Shaping chips and wafers
      • Component assembly
      • Precision machining
  • PCMP - Multi-Physics Characterization Platform
    • PCMP Staff
    • Scanning Probe Microscopy Facility
      • Air Domain
      • UHV domain
    • Hyperfrequency, Optical and Photonic Characterization (CHOP)
      • Spectroscopy
      • Static - Small signal - Noise
      • Power
      • Nano characterisation
      • MEMS
      • Microwave photonics
      • Millimetre and THz
      • Temperature measurements
    • Characterisation of COMmunicating Systems and Prototyping cluster (SigmaCOM)
      • Analog and digital communication systems
        • Energy efficiency test bench
        • Multifunctional analogue and digital I/O devices
        • Software-defined radio
        • Telecom test bench
      • Optical communication systems
      • Prototypage (SigmaCom – C2EM)
        • Design Modelling
        • Programming
        • Achievements
        • Tests & Measurements
    • Characterisation, ElectroMagnetic Compatibility and Prototyping Centre (C2EM)
      • Anechoic chamber
      • TEM cell
      • Reverberation chamber with mode mixing
      • MaMIMOSA
      • Measurement Zt
  • Services offered by our platforms
    • services of the Bio Micro Fluidic platform
    • Services of the CMNF platform
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Cité Scientifique
Avenue Henri Poincaré
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59 652 Villeneuve d'Ascq Cedex, France
Tel : 03 20 19 79 79
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