The characterization resource of the CMNF has several equipments allowing to access the main optical properties of the layers, nanostructures or components realized in the platform.
Our spectroscopic ellipsometers (Horiba) give access to complex optical indices of thin film stacks in a wide range of wavelengths (200nm to 2µm), in localized or mapping mode. They also allow to evaluate other parameters such as band gap values of materials,... Several standard spectroscopic techniques are also available to determine optical absorptions, reflectivity, photoluminescence,... We are also equipped with a platform for characterization of photovoltaic layers, including induced photo-current and reflectivity mapping,...
A photoluminescence measurement bench equipped with an argon ionized laser and a YAG laser (Spectra-Physics) allows to work on low or wide band gap materials, at low temperature or at room temperature, in 'classical' photoluminescence or in photoluminescence excitation (see website of the EPIPHY group).
A photoluminescence measurement bench equipped with an argon ionized laser and a YAG laser (Spectra-Physics) allows to work on low or wide band gap materials, at low temperature or at room temperature, in 'classical' photoluminescence or in photoluminescence excitation (see website of the EPIPHY group).
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