Ar's ion beam etching (IBE) can be used to etch very hard metals and materials, and is a highly suitable technique for surface etching (< 100 nm) and high resolution. This type of etching covers a wide range of the IEMN's R&D activities. In addition to the Ar beam, the IBE reactor has 6 gas lines that will allow us to add reactive ions (RIBE) or a chemical component (fluorine or methane) and work in CAIBE (Chemical Assistant Ion Beem Etching) mode, which gives us the possibility of extending the range of materials used. Ion beam etching can be carried out at different angles to the sample normal, allowing the angle of the etched pattern to be controlled. The recteur is equipped with a SIMS analyser to ensure precise control of the etching process. [/av_textblock] [av_textblock fold_type='' fold_height='' fold_more='Read more' fold_less='Read less' fold_text_style='' fold_btn_align='' textblock_styling_align='' textblock_styling='' textblock_styling_gap='' textblock_styling_mobile='' size='' av-desktop-font-size='' av-medium-font-size='' av-small-font-size='' av-mini-font-size='' font_color='' color='' fold_overlay_color='' fold_text_color='' fold_btn_color='theme-color' fold_btn_bg_color='' fold_btn_font_color='' size-btn-text='' av-desktop-font-size-btn-text='' av-medium-font-size-btn-text='' av-small-font-size-btn-text='' av-mini-font-size-btn-text='' fold_timer='' z_index_fold='' id='' custom_class='' template_class='' av_uid='av-lxk5gavs' sc_version='1.0' admin_preview_bg='']

Contact: Giuseppe Di Gioia, Dmitri Yarekha