Physical deposits under vacuum
We use either sputtering or thermal evaporation for metals and for some specific dielectrics depositions. We can deal with magnetic materials, thermoelectric materials, photovoltaics, dielectrics, metals or organic layers.
Five evaporation machines either by electron beam (2 Plassys MEB 550S, 1 MECA 2000) or by joule effect (Plassys Meb 450S, Aprimvide) deal with more than 3000 depositions per year on a wide range of materials (metals, dielectrics, magnetic layers): Au, Ti, Ge, Al, Pt, Ni, Mo, Cr, Pd, Ag, In, Ca, organic layers…. Deposition options include planetary rotation and holder for four 4’’ substrates.
Six sputtering process chambers for substrates up to 4”. Two Alliance concept DP650 with cold or heated substrate holders for sputtering of Au, Al, Ti, Cr, W, Cu, TiN, TiNi, TiW, Ni, TiC,… One Leybold Z550 is specific for magnetic layers deposition such as TbFe2, TbCo2, TbFeCo, FeCo, Fe, Co, CoPt, FePt, Ta, Cr… We have a fully automated sputtering cluster (Alliance concept CT 200) with 3 chambers and 14 targets, for the realization of complex structures without vaccum break and cross-contamination. It is used for single or multi-layer processes, reactive sputtering, co-sputtering in 3 fields: magnetic multilayers/metals, alloys for energy (AlN, ZnO, MgO, ITO, LiPON) and thermoelectric materials (Boron Carbides).
- Materials for photovoltaic energy in thin films
The studies are focused on the use of sputtering for the realization of the various layers of materials entering the composition of the cells, including the absorber. The different materials (functional oxides and semiconductors) are developed in the Alliance Concept CT200 sputtering cluster either from targets with adapted composition (case of CIGS) or from single element targets in confocal co-sputtering configuration for the new materials (case of the Zn(Sn, Ge, Si)N2 die) If necessary, the influence of a thermal post-treatment (Jipelec RTA) is investigated on the behavior of the materials.
1. cellule solaire en films minces de type CIGS (empilement Mo/CIGS/ZnO:Al entièrement déposé en pulvérisation cathodique)
- Magnetic layer deposition by sputtering
Two sputtering frames are used for the deposition of metallic magnetic layers: A Leybold Z550 (RF, DC) and the Alliance Concept CT200 cluster chamber 1 (RF, DC, DC-pulse). The main materials deposited are transition metals (Fe, Co), alloys with rare earths (Tb, Sm, Gd) and combinations with non-magnetic buffers (Cu, Ru, Pt...). A particular know-how exists on the deposition of nanostructured magnetostrictive layers of type Nx[TbCo.2 (x nm)/FeCo (y nm). with controlled magnetic anisotropy. These stacks are used for applications such as magnetization control by magnetoelectric effect or coupling with surface acoustic waves.
1. Exemple de multicouche magnéto-élastique utilisé dans un capteur de champ magnétique à ondes acoustiques de surface (SAW). Groupe Aiman-films
- Electrochemical energy (micro) storage: materials for all-solid state lithium ion micro-batteries and micro-supercapacitors (thickness range 0.1 to 20 µm depending on the application). In the field of lithium ion micro-batteries, IEMN (CSAM group) has a recognized expertise on:
- Titanium nitride lithium diffusion barrier deposit (TiN, bati Alliance concept 4 " DP650, Journal of the Electrochemical Society 2015)
- the development of LiPON type solid electrolyte (> 1 µm, cluster CT 200, Material Chemistry and Physics 2010)
- the development of high potential positive electrode in LiFePO4/C and LiMn1.5Ni0.5O4 (< 10 µm, cluster CT 200, Chem mat 2017 & ESM 2018)
- the development of a negative electrode in Nb2O5 (< 3 µm, cluster CT 200)< 3 µm, cluster CT 200)
-micro-supercapacitor (CSAM group), the know-how is based on:
- the development of metal carbide (TiC, < 20 µm, cluster CT 200, Science 2016, Electrochemica acta 2016, Journal of power sources 2016 & AFM 2017) for carbon/carbon micro-supercapacitors
- the development of VN or WN transition metal nitride (< 10 µm, Cluster CT 200, Advanced Materials Technologies 2018) as pseudocapacitive electrode)
Contact: Marc Dewitte, Annie Fattorini, Isabelle Roch Jeune (resource manager)