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PLATEFORME : CENTRALE DE MICRO NANO FABRICATION
Slide thumbnailPLATEFORME : CENTRALE DE MICRO NANO FABRICATION
PLATEFORME : CENTRALE DE MICRO NANO FABRICATION
PLATEFORME : CENTRALE DE MICRO NANO FABRICATION

Electronic Lithography

The electron lithography area is equipped with 2 EBPG 5000plus (100kV) electronic maskers with automatic 10-position airlock, which allow resolutions of the order of 10nm. The size of the samples can go from a few mm² to 4 inches. With more than 2000 writings per year on a wide range of applications, the team benefits from a real expertise thanks to a capitalization of the feedback. The involvement of researchers in the implementation of the resource aims to better share the expertise acquired in the field for over 20 years and to optimize its use for each field of application.

Expertise and know-how: some highlights

- High resolution and writing speed.

Realization of dense arrays of nanoplots by ultra-fast writing methods (Dots On The Fly or Sequential). In addition to its very high writing speed (factor 80) the sequential method can offer a smoothing of the contours.

1. Nanoplots of 10-15nm gold spaced 50nm apart on silicon, after lift-off, made by sequential method [Ref]

- Optical resins used in electronics

The use of optical resins in e-beam offers a better dry etch resistance and a high aspect ratio for very deep etches up to 100µm in silicon.

2. UV210 used in ebeam: 500nm lines spaced at 500nm.

- Three-layer process

The use of selectively developed tri-layers of resin makes it possible to obtain the profiles necessary for the realization of T-grids.

3. Three-layer process, after development and after litf-off (inset)

Expertise and know-how: other
  • Resin dilution
  • Concentration of resins by distillation of solvents for use in e-beam
  • Use of conductive polymers allowing the flow of charges on insulating materials
  • CMNF - Micro and Nano Fabrication Center
    • CMNF Staff
    • Deposits and epitaxy division
      • Chemical Vapour Deposition (CVD)
      • Physical Vapour Deposition (PVD)
      • Inkjet printing
      • Heat tratments
      • Chemical synthesis and surface functionalisation
      • Epitaxial growth
    • Lithography Unit
      • Electronic Lithography
      • Optic Lithography
      • 2D laser lithography
      • Collage
    • Engraving and implantation pole
      • Etching and plasma treatment
      • Deep etching of silicon
      • Chemical vapor etching
      • Ion beam etching
      • Focused Ion Beam
      • Ion implantation
      • Wet etching and surface preparation
    • In Line Analysis Unit
      • Structural characterizations
      • Electrical properties
      • Propriétés optiques et spectroscopies
      • Microscopy Topography Morphology
      • Faisceau / beam
    • Soft Lithography and Bio Microfluidics
      • Soft lithography
      • BioMicroFluidics
    • Packaging Division
      • Shaping chips and wafers
      • Component assembly
      • Precision machining
  • PCMP - Multi-Physics Characterization Platform
    • PCMP Staff
    • Scanning Probe Microscopy Facility
      • Air Domain
      • UHV domain
    • Hyperfrequency, Optical and Photonic Characterization (CHOP)
      • Spectroscopy
      • Static - Small signal - Noise
      • Power
      • Nano characterisation
      • MEMS
      • Microwave photonics
      • Millimetre and THz
      • Temperature measurements
    • Characterisation of COMmunicating Systems and Prototyping cluster (SigmaCOM)
      • Analog and digital communication systems
        • Energy efficiency test bench
        • Multifunctional analogue and digital I/O devices
        • Software-defined radio
        • Telecom test bench
      • Optical communication systems
      • Prototypage (SigmaCom – C2EM)
        • Design Modelling
        • Programming
        • Achievements
        • Tests & Measurements
    • Characterisation, ElectroMagnetic Compatibility and Prototyping Centre (C2EM)
      • Anechoic chamber
      • TEM cell
      • Reverberation chamber with mode mixing
      • MaMIMOSA
      • Measurement Zt
  • Services offered by our platforms
    • services of the Bio Micro Fluidic platform
    • Services of the CMNF platform
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Cité Scientifique
Avenue Henri Poincaré
CS 60069
59 652 Villeneuve d'Ascq Cedex, France
Tel : 03 20 19 79 79
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