Deposits and epitaxy division

The micro-nanofabrication facility offers a wide range of thin-film deposition techniques to cover a wide variety of material properties. For several years, we have capitalized on our know-how in many fields such as :

- deposits of materials for energy in atomic or thin conformal layers

- silicon technology using thermal or low temperature deposition processes

- multilayers of magnetic and multi-ferroic nanostructured materials

- organic deposits for biosystems or organic and molecular electronics

_ electrochemical thickenings

- metal deposits used for contact the active layers components of several dies (Si, III/V, III/N)

- growth and integration of monolayer or multilayer graphene in components

- localized deposits in direct writing by inkjet printing on flexible material

These activities are based on a set of techniques grouped into 4 areas: chemical vapor deposition, physical vacuum deposition, organic thin film deposition and electrochemical deposition and inkjet printing.