Developing new materials for energy storage and micro-storage
The group is drawing on the technological resources of the IEMN to develop new materials in thin-film technologies that will be integrated into energy storage micro-devices manufactured in clean rooms. The group has expertise in the development of porous materials based on binary transition metal nitride (VN, W2N, Mo2N, RuN, TiN, NbN, etc.) acting as electrodes for micro-supercapacitors. To increase storage performance, one approach we have chosen is to develop multi-cationic thin films (ternary, quaternary and quinary transition nitride) by magnetron sputtering in planar or confocal mode. In order to obtain an electrode in which 2 cations are electroactive, we will alternate nanometric layers of binary thin films ('nanolaminate' approach) in which we will co-sputter the two metals simultaneously under Ar/N2/O2. The confocal mode approach makes it possible to implement a combinatorial approach that can scan a large number of different compositions/phases. To achieve this optimisation, we will be using a sputtering frame with several confocal sources, which will enable us to obtain a chemical composition gradient on a complete 4-inch wafer. Using multi-technique mapping tools (structural, chemical, mechanical, electrical, electrochemical, etc.), we will be able to trace the composition and structure of the deposit at wafer scale.
Micro super-capacitors