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A lecturer/researcher - EMC and telecommunications and a lecturer/researcher - high-performance electronics using 2D materials
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A lecturer/researcher - EMC and telecommunications and a lecturer/researcher - high-performance electronics using 2D materials
One Teacher/Researcher - EMC and telecommunications and one Teacher/Researcher - High-performance electronics using 2D materials -> More details...
- The NeaSNOM Microscope" - "Nano-FTIR: Infrared spectroscopic chemical identification of materials at nanoscale" by Dr. Andreas HUBER from Neaspec GmbH F. Huth1,2, A. Govyadinov2, S. Amarie1, W. Nuansing2, A.J. Huber1, F. Keilmann3, and R. Hillenbrand2,4. 1 Neaspec GmbH, Martinsried, Germany; 2 CIC Nanogune Consolider, Donostia-San Sebastian, Spain; 3 Dept. of Physics and CeNS, Ludwigs-Maximilians-Universität, [...]
For the first time, researchers at LAAS and IEMN have built a truly 3D nanometric transistor. The miniaturisation limits for electronic components may be further away than previously thought. A team from the Systems Analysis and Architecture Laboratory (LAAS-CNRS, Toulouse) and the Electronics, Microelectronics and Nanotechnology Institute (CNRS/University of Toulouse) have [...]
Equipex LEAF project: 'Laser procEssing plAtform for multiFunctional electronics on Flex' Kick-off Meeting Wednesday 20 March 2013 IEMN, Avenue Poincaré, Villeneuve d'Ascq, France Morning session open to the public (registration required) AGENDA 9:30 Welcome (IEMN Hall) 10:00 - 10:30 Presentation of the EQUIPEX LEAF project 10:30 - 11:10 Daniel BENSAHEL ( Manager advanced front-end materials) ST Microelectronics, Crolles [...]
29/03/2013 - from 10am to 4pm The Technological Research Base network (RTB) is a national network of major micro- and nanofabrication centres. This network is available to all academic and industrial communities interested in micro and nanotechnologies and invites you to a day of information and exchange on the possibilities [...]
The first demonstration of the fabrication of millimetre-wave power transistors of the HEMT AlGaN/GaN type on highly resistive silicon (110) substrate was carried out at the IEMN in collaboration with the CRHEA [A. SOLTANI et al, IEEE Electron Device Letters, published online on 7March 2013]. Typically, these heterostructures are obtained by epitaxy [...].
Published in "Industrie & Technologies" magazine (October 2012): [...]
On behalf of all past and present staff at the IEMN, congratulations to the organisers on the success of our laboratory's 20th anniversary. Gilles Dambrine and Lionel Buchaillot
Link to article: http://phys.org/news/2012-01-team-photoelectrowetting-circuit.html