Atelier consacré à la préparation des substrats pour l’épitaxie
22-24 May 2018 IEMN - Villeneuve d'Ascq Abstract: Substrate preparation (cleaning, surface roughness, deoxidation, patterning, etc...) is an important step for the quality of epitaxial semiconductor layers. It has become crucial at a time when current research is focusing on subjects such as heteroepitaxy on silicon, lateral epitaxy [...].





