Summary:

In the semiconductor industry, effective cleaning of wet contamination is a key factor in ensuring the quality of electronic products. The cycle between the wetting and drying processes can then create several problems in micro/nanometric structures with high aspect ratios. In this thesis, we present the characterisation of the dynamic wetting of fluids within structures.

Abstract:

In the semiconductor industry, effective cleaning of wet contamination is a critical factor in ensuring the quality of electronic products. The cycle between the wetting and drying processes can then create several problems in high aspect ratio micro/nanometer structures. In this thesis, we present the characterization of dynamic wetting of fluids within structures