State-of-the-art electron lithography equipment:

The EBPG5200Plus (Raith)

As part of the CPER IMITECH and the PEPR Electronics – France 2030 initiatives,

the IEMN is strengthening its technological capabilities with the acquisition of a new, state-of-the-art electron lithography system: the EBPG5200Plus (Raith).

More advanced than the EBPG5000Plus already in service, this state-of-the-art tool will support IEMN’s research projects across a wide range of devices, including micro-batteries, neuromorphic devices, MEMS/NEMS sensors and III-V technologies, in response to the current and future needs of researchers and industry.

Key advantages:

• increased positioning accuracy

• significant reduction in exposure field misalignment (stitching)

• improved overlay

• increased writing speed

• expanded writing fields and sample sizes

• ability to expose non-planar samples

This equipment opens up new scientific and application prospects, reinforcing the IEMN’s position as a major player in advanced micro- and nano-fabrication.

This purchase was made possible thanks to the financial support of the PEPR Electronics as part of France Relance 2030 as well as the CPER IMITECH.

The necessary preparations for the installation of this equipment in the cleanroom were successfully completed thanks to the involvement of the Lithography and Maintenance Divisions at IEMN. The commissioning of the equipment also benefited from the technical expertise of engineers from RAITH, thereby ensuring that everything ran smoothly.