State-of-the-art electron lithography equipment:

The EBPG5200Plus (Raith)

As part of the CPER IMITECH and the PEPR Electronics – France 2030 initiatives,

the IEMN is strengthening its technological capabilities with the acquisition of a new, state-of-the-art electron lithography system: the EBPG5200Plus (Raith).

More advanced than the EBPG5000Plus already in service, this state-of-the-art tool will support IEMN’s research projects across a wide range of devices, including micro-batteries, neuromorphic devices, MEMS/NEMS sensors and III-V technologies, in response to the current and future needs of researchers and industry.

Key advantages:

• increased positioning accuracy

• significant reduction in stitching

• improved overlay

• increased writing speed

• expanded writing fields and sample sizes

• ability to expose non-planar samples

This equipment opens up new scientific and application prospects, reinforcing the IEMN’s position as a major player in advanced micro- and nano-fabrication.

This purchase was made possible thanks to the financial support of the PEPR Electronics as part of France Relance 2030 as well as the CPER IMITECH, to whom we extend our warmest thanks.

We would also like to express our sincere gratitude to the members of the Lithography and Maintenance Units at IEMN for their commitment and hard work in preparing the cleanroom to accommodate this equipment. Finally, we would like to extend our warmest thanks to the engineers at RAITH for their excellent support during the installation and commissioning of the equipment.