Electron beam lithography
Contacts:
At IEMN, electron beam lithography (EBL) is a core technology. We have been using EBL from 1984 and we presently have two lithography tools, a VISTEC EBPG5000Plus and a VISTEC EBP5000PlusES. The ES system has been installed at the end of 2006 giving the possibility to researchers to carry out their own exposure tasks and to increase their expertise in the applications of EBL to their research topics
VISTEC EBPG5000Plus
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High Resolution Gaussian Beam System
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Thermal Field Emission Gun
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50MHz Pattern Generator
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Interferometer stage, 0.6 nm positioning accuracy
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Acceleration voltage: 20 kV, 50 kV or 100 kV
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Automatic 10 positions airlock
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Holders for 2” to 4” wafers , 3” to 5”masks and smaller piece parts
- Overlay and stitching better than 30 nm
VISTEC EBPG5000Plus ES
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Same as above except:
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20MHz Pattern Generator
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Automatic 2 positions airlock