{"id":76934,"date":"2026-01-23T11:52:42","date_gmt":"2026-01-23T09:52:42","guid":{"rendered":"https:\/\/www.iemn.fr\/?p=76934"},"modified":"2026-02-13T16:48:14","modified_gmt":"2026-02-13T14:48:14","slug":"le-laboratoire-se-dote-de-nouveaux-equipements-de-pointe","status":"publish","type":"post","link":"https:\/\/www.iemn.fr\/en\/a-la-une\/le-laboratoire-se-dote-de-nouveaux-equipements-de-pointe.html","title":{"rendered":"Le laboratoire se dote de nouveaux \u00e9quipements de pointe"},"content":{"rendered":"<div  class='flex_column av-2jm6i2u-6db82a5a37101b0d043b97a05049b8a3 av_one_full  avia-builder-el-0  el_before_av_hr  avia-builder-el-first  first flex_column_div'     ><section  class='av_textblock_section av-mkqp95a8-f971cffb14dfb0d93e2636346fbc3bab'   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1 style=\"text-align: center;\">Le laboratoire se dote de nouveaux \u00e9quipements de pointe<\/h1>\n<\/div><\/section><\/div>\n<div  class='hr av-294ctl2-052003d1dab071efe8c55ba0a37060d0 hr-default  avia-builder-el-2  el_after_av_one_full  el_before_av_one_half'><span class='hr-inner'><span class=\"hr-inner-style\"><\/span><\/span><\/div>\n<div  class='flex_column av-1or5i3q-4219f13a137dd7f28fe6004a2ef38904 av_one_half  avia-builder-el-3  el_after_av_hr  el_before_av_one_half  first flex_column_div'     ><p><div  class='avia-video av-mkqpcdry-9c8a1a8720102bb6280f571012ecf85f avia-video-16-9 av-no-preview-image avia-video-load-always avia-video-html5'  itemprop=\"video\" itemtype=\"https:\/\/schema.org\/VideoObject\"  data-original_url='https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBE.mp4'><video class='avia_video'    preload=\"auto\"  controls id='player_76934_576517995_1827826775'><source src='https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBE.mp4' type='video\/mp4' \/><\/video><\/div><br \/>\n<section  class='av_textblock_section av-mkqpap7e-5667cf1b5442744673c695d7a157d1fd'   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2 style=\"line-height: 20pt; text-align: left;\"><strong>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-mqde7m-1-7-878dc3023f03f2d10e588e5e9cbf63c5\">\n.av_font_icon.av-mqde7m-1-7-878dc3023f03f2d10e588e5e9cbf63c5{\ncolor:#f16728;\nborder-color:#f16728;\n}\n.av_font_icon.av-mqde7m-1-7-878dc3023f03f2d10e588e5e9cbf63c5 .av-icon-char{\nfont-size:32px;\nline-height:32px;\n}\n<\/style>\n<span  class='av_font_icon av-mqde7m-1-7-878dc3023f03f2d10e588e5e9cbf63c5 avia_animate_when_visible av-icon-style- avia-icon-pos-left avia-icon-animate'><span class='av-icon-char' aria-hidden='true' data-av_icon='\ue885' data-av_iconfont='entypo-fontello' ><\/span><\/span>Un double r\u00e9acteur d\u2019\u00e9laboration de semiconducteurs pour les t\u00e9l\u00e9coms ultra-haut d\u00e9bit arrive \u00e0 l\u2019IEMN<\/strong><\/h2>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10\">\n#top .togglecontainer.av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10 p.toggler{\nfont-size:17px;\nbackground-color:#cee2e8;\n}\n#top .togglecontainer.av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10 p.toggler.activeTitle{\ncolor:#025277;\nborder-color:#025277;\n}\n#top .togglecontainer.av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10 p.toggler .toggle_icon{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10 p.toggler .toggle_icon > span{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10 .toggle_wrap .toggle_content{\nbackground-color:#cee2e8;\n}\n<\/style>\n<div  class='togglecontainer av-mkqqpcc3-3cce053eeea6b562b98a0ae20a3e6f10  avia-builder-el-7  el_after_av_textblock  avia-builder-el-last  toggle_close_all' >\n<section class='av_toggle_section av-1yy53dy-2a673ae9f20dd0002d6e0dd54f38f48b'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div role=\"tablist\" class=\"single_toggle\" data-tags=\"{All} \"  ><p id='toggle-toggle-id-1' data-fake-id='#toggle-id-1' class='toggler  av-title-above'  itemprop=\"headline\"  role='tab' tabindex='0' aria-controls='toggle-id-1' data-slide-speed=\"200\" data-title=\" L\u2018IEMN vient d\u2019installer un nouvel \u00e9quipement majeur pour la fabrication de semiconducteurs : un double r\u00e9acteur d\u2018\u00e9pitaxie RIBER connect\u00e9 sous ultra-vide. Cet investissement strat\u00e9gique permet le d\u00e9veloppement de composants \u00e9lectroniques d\u2019avant-garde pour la 6G (t\u00e9l\u00e9communications \u00e0 tr\u00e8s haut d\u00e9bit) et l\u2018opto\u00e9lectronique THz. Le syst\u00e8me offre un contr\u00f4le accru des propri\u00e9t\u00e9s des couches semiconductrices III-V \u00e9pitaxi\u00e9es et permet \u00e9galement d\u2019explorer de nouvelles opportunit\u00e9s d\u2019int\u00e9gration sur silicium et de croissance s\u00e9lective \u00e0 l\u2019\u00e9chelle nanom\u00e9trique.\" data-title-open=\"\" data-aria_collapsed=\"Click to expand:  L\u2018IEMN vient d\u2019installer un nouvel \u00e9quipement majeur pour la fabrication de semiconducteurs : un double r\u00e9acteur d\u2018\u00e9pitaxie RIBER connect\u00e9 sous ultra-vide. Cet investissement strat\u00e9gique permet le d\u00e9veloppement de composants \u00e9lectroniques d\u2019avant-garde pour la 6G (t\u00e9l\u00e9communications \u00e0 tr\u00e8s haut d\u00e9bit) et l\u2018opto\u00e9lectronique THz. Le syst\u00e8me offre un contr\u00f4le accru des propri\u00e9t\u00e9s des couches semiconductrices III-V \u00e9pitaxi\u00e9es et permet \u00e9galement d\u2019explorer de nouvelles opportunit\u00e9s d\u2019int\u00e9gration sur silicium et de croissance s\u00e9lective \u00e0 l\u2019\u00e9chelle nanom\u00e9trique.\" data-aria_expanded=\"Click to collapse:  L\u2018IEMN vient d\u2019installer un nouvel \u00e9quipement majeur pour la fabrication de semiconducteurs : un double r\u00e9acteur d\u2018\u00e9pitaxie RIBER connect\u00e9 sous ultra-vide. Cet investissement strat\u00e9gique permet le d\u00e9veloppement de composants \u00e9lectroniques d\u2019avant-garde pour la 6G (t\u00e9l\u00e9communications \u00e0 tr\u00e8s haut d\u00e9bit) et l\u2018opto\u00e9lectronique THz. Le syst\u00e8me offre un contr\u00f4le accru des propri\u00e9t\u00e9s des couches semiconductrices III-V \u00e9pitaxi\u00e9es et permet \u00e9galement d\u2019explorer de nouvelles opportunit\u00e9s d\u2019int\u00e9gration sur silicium et de croissance s\u00e9lective \u00e0 l\u2019\u00e9chelle nanom\u00e9trique.\"> L\u2018IEMN vient d\u2019installer un nouvel \u00e9quipement majeur pour la fabrication de semiconducteurs : un double r\u00e9acteur d\u2018\u00e9pitaxie RIBER connect\u00e9 sous ultra-vide. Cet investissement strat\u00e9gique permet le d\u00e9veloppement de composants \u00e9lectroniques d\u2019avant-garde pour la 6G (t\u00e9l\u00e9communications \u00e0 tr\u00e8s haut d\u00e9bit) et l\u2018opto\u00e9lectronique THz. Le syst\u00e8me offre un contr\u00f4le accru des propri\u00e9t\u00e9s des couches semiconductrices III-V \u00e9pitaxi\u00e9es et permet \u00e9galement d\u2019explorer de nouvelles opportunit\u00e9s d\u2019int\u00e9gration sur silicium et de croissance s\u00e9lective \u00e0 l\u2019\u00e9chelle nanom\u00e9trique.<span class=\"toggle_icon\"><span class=\"vert_icon\"><\/span><span class=\"hor_icon\"><\/span><\/span><\/p><div id='toggle-id-1' aria-labelledby='toggle-toggle-id-1' role='region' class='toggle_wrap  av-title-above'  ><div class='toggle_content invers-color'  itemprop=\"text\" ><h2 style=\"text-align: left;\"><\/h2>\n<p>Dans le cadre du PEPR Electronique, et gr\u00e2ce \u00e0 un financement compl\u00e9mentaire par le FEDER, la centrale de Micro-nanofabrication de l\u2019IEMN s\u2019est dot\u00e9 d\u2019un nouveau double r\u00e9acteur d\u2019\u00e9pitaxie par jets mol\u00e9culaires. Ce nouveau syst\u00e8me, mis au point par RIBER, est constitu\u00e9 de deux chambres de croissance. La premi\u00e8re de <strong>type C21-DZ<\/strong> est \u00e9quip\u00e9e de craqueurs \u00e0 vanne comme sources de phosphore, d\u2019arsenic et d\u2019antimoine, de cellules \u00e0 double filament pour l\u2019effusion des \u00e9l\u00e9ments III (In, Ga et Al), et de sources de Si, de B\u00e9ryllium et de Carbone pour le dopage. Un syst\u00e8me EZCurve permettra \u00e9galement de mesurer la d\u00e9flection du substrat pendant la croissance afin de mesurer pr\u00e9cis\u00e9ment la contrainte des alliages et d\u2019en assurer pr\u00e9cis\u00e9ment la composition.<\/p>\n<p>Gr\u00e2ce \u00e0 un module de transfert sous ultra-vide, cette chambre est connect\u00e9e \u00e0 <strong>un deuxi\u00e8me r\u00e9acteur d\u2019\u00e9pitaxie de type C21-T<\/strong> particuli\u00e8rement bien adapt\u00e9 \u00e0 la pr\u00e9paration des surfaces pour la croissance gr\u00e2ce \u00e0 son manipulateur pouvant atteindre 1200\u00b0C et la pr\u00e9sence d\u2019une cellule plasma RF pour la production d\u2019hydrog\u00e8ne atomique. Ce deuxi\u00e8me r\u00e9acteur est \u00e9galement \u00e9quip\u00e9 de sources d\u2019arsenic et d\u2019antimoine, de cellules d\u2019indium, de gallium et d\u2019aluminium et de sources de dopants dont une cellule d\u2019effusion de Fer pour le d\u00e9veloppement de photod\u00e9tecteurs ultra-rapides ou de semiconducteurs semi-isolants.<\/p>\n<p><span style=\"color: #f16728;\"><strong><img loading=\"lazy\" decoding=\"async\" class=\"alignright wp-image-75865\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBEvisuel.jpg\" alt=\"\" width=\"300\" height=\"225\" srcset=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBEvisuel.jpg 400w, https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBEvisuel-300x225.jpg 300w, https:\/\/www.iemn.fr\/wp-content\/uploads\/2025\/11\/MBEvisuel-16x12.jpg 16w\" sizes=\"auto, (max-width: 300px) 100vw, 300px\" \/><\/strong><\/span>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-57ah46-89a7f43b11b308a80730acce0ed24d5e\">\n.av_font_icon.av-57ah46-89a7f43b11b308a80730acce0ed24d5e{\ncolor:#f16728;\nborder-color:#f16728;\n}\n.av_font_icon.av-57ah46-89a7f43b11b308a80730acce0ed24d5e .av-icon-char{\nfont-size:25px;\nline-height:25px;\n}\n<\/style>\n<span  class='av_font_icon av-57ah46-89a7f43b11b308a80730acce0ed24d5e avia_animate_when_visible av-icon-style- avia-icon-pos-left avia-icon-animate'><span class='av-icon-char' aria-hidden='true' data-av_icon='\ue897' data-av_iconfont='entypo-fontello' ><\/span><\/span><strong>Gr\u00e2ce \u00e0 une homog\u00e9n\u00e9it\u00e9 accrue et un meilleur contr\u00f4le de la composition des alliages, cette nouvelle configuration de r\u00e9acteurs permettra de r\u00e9pondre aux besoins en \u00e9pitaxie dans le cadre des projets cibl\u00e9s T-REX6G et FUN-TERA du PEPR \u00e9lectronique mais offrira \u00e9galement de nouvelles opportunit\u00e9s pour la croissance d\u2019h\u00e9t\u00e9rostructures et de nanostructures innovantes pour l\u2019IEMN ou pour r\u00e9pondre aux demandes ext\u00e9rieures dans le cadre du r\u00e9seau RENATECH.<\/strong><\/p>\n<hr \/>\n<p><span style=\"color: #f16728;\"><strong>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-zpxnpi-ad29efe946aebd98f98f024abd2ca9d8\">\n.av_font_icon.av-zpxnpi-ad29efe946aebd98f98f024abd2ca9d8{\ncolor:#f16728;\nborder-color:#f16728;\n}\n.av_font_icon.av-zpxnpi-ad29efe946aebd98f98f024abd2ca9d8 .av-icon-char{\nfont-size:25px;\nline-height:25px;\n}\n<\/style>\n<span  class='av_font_icon av-zpxnpi-ad29efe946aebd98f98f024abd2ca9d8 avia_animate_when_visible av-icon-style- avia-icon-pos-left avia-icon-animate'><span class='av-icon-char' aria-hidden='true' data-av_icon='\ue805' data-av_iconfont='entypo-fontello' ><\/span><\/span><\/strong><\/span>Contact: <a href=\"mailto:Christophe.coinon@univ-lille.fr\">Christophe.coinon@univ-lille.fr<\/a><\/p>\n<p><span style=\"color: #f16728;\"><strong>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-qkknuu-301c6589ee9b0ce7a086507e7b98286c\">\n.av_font_icon.av-qkknuu-301c6589ee9b0ce7a086507e7b98286c{\ncolor:#f16728;\nborder-color:#f16728;\n}\n.av_font_icon.av-qkknuu-301c6589ee9b0ce7a086507e7b98286c .av-icon-char{\nfont-size:25px;\nline-height:25px;\n}\n<\/style>\n<span  class='av_font_icon av-qkknuu-301c6589ee9b0ce7a086507e7b98286c avia_animate_when_visible av-icon-style- avia-icon-pos-left avia-icon-animate'><span class='av-icon-char' aria-hidden='true' data-av_icon='\ue805' data-av_iconfont='entypo-fontello' ><\/span><\/span><\/strong><\/span>Contact: <a href=\"mailto:ludovic.desplanque@univ-lille.fr\">ludovic.desplanque@univ-lille.fr<\/a><\/p>\n<\/div><\/div><\/div><\/section>\n<\/div><\/p><\/div>\n<div  class='flex_column av-16lju7a-572abeb5a6a1f76c7e828db345908eb8 av_one_half  avia-builder-el-11  el_after_av_one_half  el_before_av_one_half  flex_column_div'     ><p><div  class='avia-video av-u72vnq-6902e89929f5cc7f97212ddc5fcc2fde avia-video-16-9 av-no-preview-image avia-video-load-always avia-video-html5'  itemprop=\"video\" itemtype=\"https:\/\/schema.org\/VideoObject\"  data-original_url='https:\/\/www.iemn.fr\/wp-content\/uploads\/2026\/01\/Dmitri_def_light.mp4'><video class='avia_video'    preload=\"auto\"  controls id='player_76934_1166948998_695211384'><source src='https:\/\/www.iemn.fr\/wp-content\/uploads\/2026\/01\/Dmitri_def_light.mp4' type='video\/mp4' \/><\/video><\/div><br \/>\n<section  class='av_textblock_section av-mkqq6skg-34ddc4b0e2a993167a295d1a92859571'   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2 style=\"text-align: left;\">Le Plasma Pro 80 arrive : pr\u00e9cision et performance pour la gravure des couches minces !<\/h2>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-mlky6cs7-bba7d05d55f33df7995812f089fc8963\">\n#top .togglecontainer.av-mlky6cs7-bba7d05d55f33df7995812f089fc8963 p.toggler{\nfont-size:17px;\nbackground-color:#cee2e8;\n}\n#top .togglecontainer.av-mlky6cs7-bba7d05d55f33df7995812f089fc8963 p.toggler.activeTitle{\ncolor:#025277;\nborder-color:#025277;\n}\n#top .togglecontainer.av-mlky6cs7-bba7d05d55f33df7995812f089fc8963 p.toggler .toggle_icon{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mlky6cs7-bba7d05d55f33df7995812f089fc8963 p.toggler .toggle_icon > span{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mlky6cs7-bba7d05d55f33df7995812f089fc8963 .toggle_wrap .toggle_content{\nbackground-color:#cee2e8;\n}\n<\/style>\n<div  class='togglecontainer av-mlky6cs7-bba7d05d55f33df7995812f089fc8963  avia-builder-el-14  el_after_av_textblock  avia-builder-el-last  toggle_close_all' >\n<section class='av_toggle_section av-mlky6bpq-c6648279f3a31caed4a4722b10e98423'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div role=\"tablist\" class=\"single_toggle\" data-tags=\"{All} \"  ><p id='toggle-toggle-id-2' data-fake-id='#toggle-id-2' class='toggler  av-title-above'  itemprop=\"headline\"  role='tab' tabindex='0' aria-controls='toggle-id-2' data-slide-speed=\"200\" data-title=\"Le Plasma Pro 80 arrive : pr\u00e9cision et performance pour la gravure des couches minces\" data-title-open=\"\" data-aria_collapsed=\"Click to expand: Le Plasma Pro 80 arrive : pr\u00e9cision et performance pour la gravure des couches minces\" data-aria_expanded=\"Click to collapse: Le Plasma Pro 80 arrive : pr\u00e9cision et performance pour la gravure des couches minces\">Le Plasma Pro 80 arrive : pr\u00e9cision et performance pour la gravure des couches minces<span class=\"toggle_icon\"><span class=\"vert_icon\"><\/span><span class=\"hor_icon\"><\/span><\/span><\/p><div id='toggle-id-2' aria-labelledby='toggle-toggle-id-2' role='region' class='toggle_wrap  av-title-above'  ><div class='toggle_content invers-color'  itemprop=\"text\" ><p>Plasma Pro 80 : Arriv\u00e9e d&rsquo;un nouvel \u00e9quipement de gravure par plasma CCP-RIE \u00e0 l&rsquo;IEMN !<br \/>\nDans le cadre du projet CPER IMITECH, un nouvel \u00e9quipement pour vos gravures de couches minces SiO2, SixNy, Si avec un contr\u00f4le pr\u00e9cis de la gravure en temps r\u00e9el.<\/p>\n<\/div><\/div><\/div><\/section>\n<\/div><\/p><\/div><div  class='flex_column av-12jx7mu-3d62c0417c86a070d56fd9e25ea7a532 av_one_half  avia-builder-el-15  el_after_av_one_half  avia-builder-el-last  first flex_column_div  column-top-margin'     ><p><div  class='avia-video av-mlkkgtrd-80609f768cb237d52227c61d0604c627 avia-video-16-9 av-no-preview-image avia-video-load-always avia-video-html5'  itemprop=\"video\" itemtype=\"https:\/\/schema.org\/VideoObject\"  data-original_url='https:\/\/www.iemn.fr\/wp-content\/uploads\/2026\/02\/ebeam_light3.mp4'><video class='avia_video'    preload=\"auto\"  controls id='player_76934_1214881596_1480506996'><source src='https:\/\/www.iemn.fr\/wp-content\/uploads\/2026\/02\/ebeam_light3.mp4' type='video\/mp4' \/><\/video><\/div><br \/>\n<section  class='av_textblock_section av-qgn79i-e0e74a4ab38040b176f9b4d18e0938a7'   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2 style=\"text-align: left;\">Arriv\u00e9e d&rsquo;un nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau : l\u2019EBPG5200Plus<\/h2>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e\">\n#top .togglecontainer.av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e p.toggler{\nfont-size:17px;\nbackground-color:#cee2e8;\n}\n#top .togglecontainer.av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e p.toggler.activeTitle{\ncolor:#025277;\nborder-color:#025277;\n}\n#top .togglecontainer.av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e p.toggler .toggle_icon{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e p.toggler .toggle_icon > span{\ncolor:#00559b;\nborder-color:#00559b;\n}\n#top .togglecontainer.av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e .toggle_wrap .toggle_content{\nbackground-color:#cee2e8;\n}\n<\/style>\n<div  class='togglecontainer av-mlkl2gge-30e1a09941761bcb961a17a6d7f0484e  avia-builder-el-18  el_after_av_textblock  avia-builder-el-last  toggle_close_all' >\n<section class='av_toggle_section av-mlkl1zbf-c31621866951e9213253f5b2193b6d3f'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div role=\"tablist\" class=\"single_toggle\" data-tags=\"{All} \"  ><p id='toggle-toggle-id-3' data-fake-id='#toggle-id-3' class='toggler  av-title-above'  itemprop=\"headline\"  role='tab' tabindex='0' aria-controls='toggle-id-3' data-slide-speed=\"200\" data-title=\"Nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau : l\u2019EBPG5200Plus\" data-title-open=\"\" data-aria_collapsed=\"Click to expand: Nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau : l\u2019EBPG5200Plus\" data-aria_expanded=\"Click to collapse: Nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau : l\u2019EBPG5200Plus\">Nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau : l\u2019EBPG5200Plus<span class=\"toggle_icon\"><span class=\"vert_icon\"><\/span><span class=\"hor_icon\"><\/span><\/span><\/p><div id='toggle-id-3' aria-labelledby='toggle-toggle-id-3' role='region' class='toggle_wrap  av-title-above'  ><div class='toggle_content invers-color'  itemprop=\"text\" ><p>Dans le cadre du\u00a0CPER IMITECH\u00a0et du PEPR \u00c9lectronique &#8211; France 2030, L&rsquo;IEMN renforce ses capacit\u00e9s technologiques avec l\u2019acquisition d\u2019un\u00a0nouvel \u00e9quipement de lithographie \u00e9lectronique de tr\u00e8s haut niveau\u00a0: l\u2019EBPG5200Plus (RAITH Group). Plus avanc\u00e9 que l\u2019EBPG5000Plus d\u00e9j\u00e0 en service, cet outil de pointe accompagnera les projets de recherche de l\u2019IEMN sur un large spectre de dispositifs, notamment micro-batteries, dispositifs neuromorphiques, capteurs MEMS\/NEMS et technologies III-V, en r\u00e9ponse aux besoins actuels et futurs des chercheurs et des industriels.<\/p>\n<p><strong>Principaux atouts :<\/strong><br \/>\n\u2022 Pr\u00e9cision de positionnement accrue<br \/>\n\u2022 R\u00e9duction significative du stitching<br \/>\n\u2022 Meilleure superposition des \u00e9critures (overlay)<br \/>\n\u2022 Vitesse d\u2019\u00e9criture augment\u00e9e<br \/>\n\u2022 Champs d\u2019\u00e9criture et tailles d\u2019\u00e9chantillons \u00e9largis<br \/>\n\u2022 Exposition possible d\u2019\u00e9chantillons non planaires<\/p>\n<p><strong>Cet \u00e9quipement ouvre de nouvelles perspectives scientifiques et applicatives, renfor\u00e7ant le positionnement de l\u2019IEMN comme acteur majeur de la micro- et nano-fabrication avanc\u00e9e.<\/strong><\/p>\n<\/div><\/div><\/div><\/section>\n<\/div><\/p><\/div><\/p>","protected":false},"excerpt":{"rendered":"","protected":false},"author":2,"featured_media":76974,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[3,8],"tags":[],"class_list":["post-76934","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-a-la-une","category-actualites"],"_links":{"self":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/76934","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/comments?post=76934"}],"version-history":[{"count":34,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/76934\/revisions"}],"predecessor-version":[{"id":77627,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/76934\/revisions\/77627"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media\/76974"}],"wp:attachment":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media?parent=76934"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/categories?post=76934"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/tags?post=76934"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}