{"id":16533,"date":"2018-05-14T10:06:08","date_gmt":"2018-05-14T08:06:08","guid":{"rendered":"https:\/\/www.iemn.fr?p=16533"},"modified":"2019-09-06T10:38:02","modified_gmt":"2019-09-06T08:38:02","slug":"atelier-epitaxie","status":"publish","type":"post","link":"https:\/\/www.iemn.fr\/en\/actualites\/atelier-epitaxie.html","title":{"rendered":"Atelier consacr\u00e9 \u00e0 la pr\u00e9paration des substrats pour l\u2019\u00e9pitaxie"},"content":{"rendered":"

\"\"\u00a0\u00a0\u00a0\u00a0\u00a0<\/a>\"\"<\/a><\/strong><\/p>\n

du 22 au 24 mai 2018
\nIEMN \u2013 Villeneuve d\u2019Ascq<\/strong>
\n<\/em><\/p><\/blockquote>\n

Abstract:<\/strong><\/p>\n

La pr\u00e9paration des substrats (nettoyage, rugosit\u00e9 de surface, d\u00e9soxydation, structuration, etc\u2026) est une \u00e9tape importante pour la qualit\u00e9 des couches semiconductrices \u00e9pitaxi\u00e9es. Elle est devenue cruciale alors que les recherches actuelles s\u2019orientent vers des sujets tels que l\u2019h\u00e9t\u00e9ro\u00e9pitaxie sur Silicium, l\u2019\u00e9pitaxie lat\u00e9rale ou celle de nanostructures (par croissance s\u00e9lective avec masque di\u00e9lectrique, par gravure de la surface du substrat ou par d\u00e9p\u00f4t de nanoparticules m\u00e9talliques permettant la croissance catalys\u00e9e de nanofils). Durant cet atelier du GDR PULSE, ces diff\u00e9rentes th\u00e9matiques seront abord\u00e9es afin d\u2019\u00e9changer \u00e0 partir des pr\u00e9sentations invit\u00e9es sur nos diff\u00e9rentes m\u00e9thodes de pr\u00e9paration et sur les moyens les plus ad\u00e9quats pour les caract\u00e9riser.<\/p>\n

affiche_atelier_epitaxie<\/a><\/p>\n

https:\/\/atelier-pulse.sciencesconf.org<\/a><\/p>\n

\n
\n

\"\"<\/a> \"\"<\/a> \"\"<\/a>\"\"<\/a><\/p>\n<\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"

\u00a0\u00a0\u00a0\u00a0\u00a0 22-24 May 2018 IEMN - Villeneuve d'Ascq Abstract: Substrate preparation (cleaning, surface roughness, deoxidation, patterning, etc...) is an important step for the quality of epitaxial semiconductor layers. It has become crucial at a time when current research is focusing on subjects such as heteroepitaxy on silicon, lateral epitaxy [...].<\/p>","protected":false},"author":2,"featured_media":17237,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8],"tags":[142,144,143],"class_list":["post-16533","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-actualites","tag-atelier","tag-epitaxie","tag-substrats"],"_links":{"self":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/16533","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/comments?post=16533"}],"version-history":[{"count":0,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/16533\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media\/17237"}],"wp:attachment":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media?parent=16533"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/categories?post=16533"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/tags?post=16533"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}