{"id":13108,"date":"2017-05-11T15:30:23","date_gmt":"2017-05-11T13:30:23","guid":{"rendered":"https:\/\/www.iemn.fr\/?p=13108"},"modified":"2017-05-12T15:11:13","modified_gmt":"2017-05-12T13:11:13","slug":"une-etude-dans-le-cadre-dune-collaboration-entre-liemn-et-le-fraunhofer-institute-for-photonic-microsystems","status":"publish","type":"post","link":"https:\/\/www.iemn.fr\/en\/actualites\/une-etude-dans-le-cadre-dune-collaboration-entre-liemn-et-le-fraunhofer-institute-for-photonic-microsystems.html","title":{"rendered":"Une \u00e9tude dans le cadre d\u2019une collaboration entre l\u2019IEMN et le Fraunhofer Institute for Photonic Microsystems"},"content":{"rendered":"

fait la couverture du journal Analytical Methods (RSC)<\/em><\/span><\/p>\n

\"\"<\/a>

(c) IEMN-ECM \u2013 Cr\u00e9ation graphique : Anne Callewaert \u2013 Duch\u00eane<\/p><\/div>\n

A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials<\/h5>\n

Matthieu Gaudet,<\/a><\/span> Fraunhofer Institute for Photonic Microsystems, Maria-Reiche-Str. 2, 01109 Dresden, Germany
\n<\/span>\"\"<\/a> matthieu.gaudet@ipms.fraunhofer.de<\/a><\/p>\n

Steve Arscott<\/a>, <\/span>Institut d\u2019Electronique, de Micro\u00e9lectronique et de Nanotechnologie (IEMN), CNRS UMR8520, The University of Lille, Cit\u00e9 Scientifique, Avenue Poincar\u00e9, 59652 Villeneuve d\u2019Ascq, France<\/span>
\n\"\"<\/a> steve.arscott@iemn.univ-lille1.fr<\/a><\/div>\n

Abstract:<\/strong><\/p>\n

We provide here a user-friendly guide to find the optimum i-line (365 nm) photolithographic exposure dose of an arbitrary thickness of SU-8 on various substrate materials and thin film coatings used in MEMS, microsystems and microelectronics technologies: semiconductors, 2D materials (graphene and MoS2) plastics, glass, metals and ceramics. By considering the variation of the absorption coefficient of SU-8 to ultraviolet light and the effect of partial reflections during the photolithography, we develop an analytical model for the exposure of SU-8. The critical exposure dose of the SU-8 enables a calculation of the exact greyscale photolithographic exposure time of the photoresist which optimizes the fabrication of microsystems structures (microcantilevers, microbridges, microchannels\u2026) of a desired thickness. The optimum exposure doses are presented in both graphical and tabular format to enable user-friendly information based on the desired SU-8 thickness, the desired greyscale thickness and the specific wafer or coating used for the deposition. Interestingly, in the context of grey-scale lithography the model predicts that the surface reflectivity has a major impact on the resulting membrane thickness for a fixed dose and reducing the SU-8 thickness \u2013 on a highly reflecting surface a thicker membrane is obtained, on a low reflecting surface a thinner membrane in obtained when reducing the SU-8 thickness. The result is a useful guide for designers working with SU-8 in the context of many fabrication processes, e.g. MEMS, laboratory on a chip, microfluidics, microsystems, microengineering, micromoulding, and flexible electronics etc. \u2013 where a myriad of coatings and wafers are now used.<\/p>\n

Anal. Methods<\/strong><\/em><\/a>, 2017,9<\/strong>, 2495-2504
\nDOI: <\/strong>10.1039\/C7AY00564D, Paper<\/div>","protected":false},"excerpt":{"rendered":"

fait la couverture du journal Analytical Methods (RSC) A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials Matthieu Gaudet, Fraunhofer Institute for Photonic Microsystems, Maria-Reiche-Str. 2, 01109 Dresden, Germany matthieu.gaudet@ipms.fraunhofer.de Steve Arscott, Institut d’Electronique, de Micro\u00e9lectronique et de Nanotechnologie (IEMN), […]<\/p>","protected":false},"author":2,"featured_media":13107,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8,30],"tags":[],"class_list":["post-13108","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-actualites","category-breves"],"_links":{"self":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/13108","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/comments?post=13108"}],"version-history":[{"count":0,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/posts\/13108\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media\/13107"}],"wp:attachment":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media?parent=13108"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/categories?post=13108"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/tags?post=13108"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}