{"id":855,"date":"2012-05-17T13:05:02","date_gmt":"2012-05-17T11:05:02","guid":{"rendered":"https:\/\/www.iemn.fr\/?page_id=855"},"modified":"2012-05-17T13:05:02","modified_gmt":"2012-05-17T11:05:02","slug":"scanning-electronic-microscopy","status":"publish","type":"page","link":"https:\/\/www.iemn.fr\/en\/scanning-electronic-microscopy","title":{"rendered":"Scanning electronic microscopy"},"content":{"rendered":"<h1>Scanning electronic microscopy<\/h1>\n<blockquote><p>Contact : Christophe BOYAVA<\/p><\/blockquote>\n<h2>Watching and validation of laboratory nanoscale processes<\/h2>\n<p>The electron beam technology\u00a0 allow to view and\u00a0 dimensionner devices,\u00a0 which the waist is\u00a0 order of ten\u00a0 nanometers.<\/p>\n<p>The surface or\u00a0 cleft cutting view is possible on every insulated materials ( resins, oxides or nitrides) or conductors (Si or III\/V substrat , metallizations,. )<\/p>\n<p>The\u00a0 range accelerations\u00a0 voltage ( 200V to 30kV ) allows all view without metallization in court of process<\/p>\n<h2>Equipment\u00a0: ULTRA 55\u00a0 Zeiss<\/h2>\n<p>Electron Gun\u00a0:\u00a0 FEG ( field effect gun)<\/p>\n<p>Features\u00a0:<\/p>\n<ul>\n<li>Acceleration Voltage 200 V -30 kV<\/li>\n<li>Resolutions 1.7 nm at 1 kV and 1 nm at 15 kV<\/li>\n<li>Magnification 20X to 900 000X<\/li>\n<li>2 Secondary detectors:\u00a0 INLENS and External<\/li>\n<li>2 backscratted detectors: QBSD and EsB<\/li>\n<li>stage 130 mm by 130 mm<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<p><a href=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/ultra_vs.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-474\" title=\"Ultra 55\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/ultra_vs.jpg\" alt=\"Ultra 55\" width=\"225\" height=\"300\" \/><\/a><\/p>\n<h2>Supra 55 V<\/h2>\n<p>Electron Gun\u00a0:\u00a0 FEG ( field effect gun)<\/p>\n<p>Features :<\/p>\n<ul>\n<li>Acceleration Voltage 200 V -30 kV<\/li>\n<li>Resolutions 1.7 nm at 1 kV and 1.5 nm at 15 kV<\/li>\n<li>Magnification 20X to 900 000X<\/li>\n<li>2 Secondary Detectors\u00a0:\u00a0 INLENS \/\u00a0External<\/li>\n<li>1 VPSE Detector<\/li>\n<li>stage 130 mm by 130mm<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<p><a href=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/supra_55_vp_s.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-475\" title=\"SUPRA 55 VP\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/supra_55_vp_s.jpg\" alt=\"SUPRA 55 VP\" width=\"400\" height=\"300\" \/><\/a><\/p>\n<h2><a title=\"Caract\u00e9risations chimiques\" href=\"https:\/\/www.iemn.fr\/en\/les-moyens\/centrale-de-technologie\/ses-equipements\/caracterisations\/caracterisations-chimiques\/\">X-ray energy dispersive spectroscopy<\/a><\/h2>\n<p><a href=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/bruker_s.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-476\" title=\"Spectroscopie par dispersion en \u00e9nergie X - 1\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/bruker_s.jpg\" alt=\"Spectroscopie par dispersion en \u00e9nergie X - 1\" width=\"300\" height=\"225\" \/><\/a><a href=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/quantax1_s.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-477\" title=\"Spectroscopie par dispersion en \u00e9nergie X - 2\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/quantax1_s.jpg\" alt=\"Spectroscopie par dispersion en \u00e9nergie X - 2\" width=\"300\" height=\"225\" \/><\/a><\/p>\n<h2>EBSD<\/h2>\n<p><a href=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/ebsd_s.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-478\" title=\"EBSD\" src=\"https:\/\/www.iemn.fr\/wp-content\/uploads\/2012\/05\/ebsd_s.jpg\" alt=\"EBSD\" width=\"300\" height=\"225\" \/><\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>Scanning electronic microscopy Contact : Christophe BOYAVA Watching and validation of laboratory nanoscale processes The electron beam technology\u00a0 allow to view and\u00a0 dimensionner devices,\u00a0 which the waist is\u00a0 order of ten\u00a0 nanometers. The surface or\u00a0 cleft cutting view is possible on every insulated materials ( resins, oxides or nitrides) or conductors (Si or III\/V substrat [&hellip;]<\/p>","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"open","template":"","meta":{"footnotes":""},"class_list":["post-855","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages\/855","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/comments?post=855"}],"version-history":[{"count":0,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages\/855\/revisions"}],"wp:attachment":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media?parent=855"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}