{"id":840,"date":"2012-05-17T12:34:44","date_gmt":"2012-05-17T10:34:44","guid":{"rendered":"https:\/\/www.iemn.fr\/?page_id=840"},"modified":"2012-05-17T12:34:44","modified_gmt":"2012-05-17T10:34:44","slug":"facilities","status":"publish","type":"page","link":"https:\/\/www.iemn.fr\/en\/facilities","title":{"rendered":"Facilities"},"content":{"rendered":"<h1>Facilities<\/h1>\n<h2>Growth and deposition of thin layer<\/h2>\n<ul>\n<li>\u00a0\u00a0\u00a0 Atomic Layer Deposition ( ALD )<\/li>\n<li>\u00a0\u00a0\u00a0 Organic layer deposition, syntheses<\/li>\n<li>\u00a0\u00a0\u00a0 Metalic deposition<\/li>\n<li>\u00a0\u00a0\u00a0 Ionic implantation<\/li>\n<li>\u00a0\u00a0\u00a0 Molecular beam epitaxy<\/li>\n<li>\u00a0\u00a0\u00a0 Hot process LP-CVD<\/li>\n<li>\u00a0\u00a0\u00a0 Cold process PE-CVD<\/li>\n<\/ul>\n<h2>Lithography<\/h2>\n<ul>\n<li>\u00a0\u00a0\u00a0 e Beam lithography<\/li>\n<li>\u00a0\u00a0\u00a0 Optical lithography<\/li>\n<\/ul>\n<h2>\nEtching<\/h2>\n<ul>\n<li>\u00a0\u00a0\u00a0 Dry etching : Plasma<\/li>\n<li>\u00a0\u00a0\u00a0 Wet etching : Chemical<\/li>\n<li>\u00a0\u00a0\u00a0 Polishing<\/li>\n<\/ul>\n<h2>\nCaracterisation<\/h2>\n<ul>\n<li>\u00a0\u00a0\u00a0 FIB<\/li>\n<li>\u00a0\u00a0\u00a0 SEM<\/li>\n<li>\u00a0\u00a0\u00a0 Optical microscopy<\/li>\n<li>\u00a0\u00a0\u00a0 Chemical caracterisation<\/li>\n<li>\u00a0\u00a0\u00a0 electrical caracterisation<\/li>\n<li>\u00a0\u00a0\u00a0 mechanical caracterisation<\/li>\n<li>\u00a0\u00a0\u00a0 Optical caracterisation<\/li>\n<li>\u00a0\u00a0\u00a0 physical caracterisation<\/li>\n<li>\u00a0\u00a0\u00a0 Packages<\/li>\n<\/ul>\n<p>&nbsp;<\/p>","protected":false},"excerpt":{"rendered":"<p>Facilities Growth and deposition of thin layer \u00a0\u00a0\u00a0 Atomic Layer Deposition ( ALD ) \u00a0\u00a0\u00a0 Organic layer deposition, syntheses \u00a0\u00a0\u00a0 Metalic deposition \u00a0\u00a0\u00a0 Ionic implantation \u00a0\u00a0\u00a0 Molecular beam epitaxy \u00a0\u00a0\u00a0 Hot process LP-CVD \u00a0\u00a0\u00a0 Cold process PE-CVD Lithography \u00a0\u00a0\u00a0 e Beam lithography \u00a0\u00a0\u00a0 Optical lithography Etching \u00a0\u00a0\u00a0 Dry etching : Plasma \u00a0\u00a0\u00a0 Wet etching : [&hellip;]<\/p>","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":15,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-840","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages\/840","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/comments?post=840"}],"version-history":[{"count":0,"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/pages\/840\/revisions"}],"wp:attachment":[{"href":"https:\/\/www.iemn.fr\/en\/wp-json\/wp\/v2\/media?parent=840"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}