E.S.C.A.
Contact : site web du groupe EPIPHY
The surface analysis system (Electron Spectroscopy for Chemical Analysis) is connected under ultra-high vacuum to the 2 molecular beam epitaxy racks and to an airlock allowing the analysis of all types of samples. The base is a Physical Electronics type 5600 system mechanically modified by Sinvaco to ensure compatibility with 3 inch MBE molyblocks. It is equipped with :
- a manipulator allowing the 3 translations and 2 rotations (polar and azimuthal)
- a hemispherical analyzer with a 150 mm radius
- of a standard X-ray source with a Dual anode Al(1487eV)/Mg(1254 eV)
- of a monochromatized X-ray source Al (1487 eV)
- an electron gun with a maximum energy of 8 keV and a spot size of about 20 mm
- an ionic sputtering gun with a maximum energy of 5 keV
- a source of UV HeI rays (21.2 eV)
- an electronic neutralisation gun for the analysis of insulators
- a low energy electron diffractometer (LEED)
In X-ray induced electron spectroscopy (XPS), the ultimate resolution of the system measured as the width at half height of the Ag 3d5/2 line is 0.45 eV.
Spectroscopie dispersive en énergie
Contact : Christophe BOYAVAL
Système EDS Xflash 4010 Bruker
Type SDD (Silicon Drift Detector)
Caractéristique
- Résolution du Mn Ka à 127 eV de 0 à 100 000 cps
QUANTAX 200 Analyse chimique élémentaire
- Qualitative
- Quantitative
- Mapping